1200-PO-duo
Flexible Coating Platform for Advanced Thin‑Film Processes in Precision Optics
The 1200‑PO‑duo is Satisloh’s most versatile thin‑film coating platform, manufactured for highest coating precision for a wide range of optical materials and coating designs. Its flexible component configuration options allow manufacturers to tailor the system precisely to their application needs and priorities, whether it is coating complexity, thermal sensitivity or throughput.
Advanced e-beam guns combined with versatile thermal evaporation sources enable a wide range of sophisticated, complex multilayer coatings with excellent uniformity and reproducibility. Integrated process control, optical monitoring, and a planetary heater ensure stable process conditions and consistent coating quality. Various substrate holder configurations including planetary and sector dome options provide high process flexibility by addressing a broad spectrum of substrates and coating processes.
- One flexible platform with a broad material compatibility for glass, plastic, and crystalline optics, enabling multiple product types to be coated
- Advanced dual electron‑beam and high‑power thermal sources support complex multilayer stacks while reducing cycle times and material changeovers
- High coating uniformity (<1% deviation) across large 15‑inch planetary substrates, independent of material or deposition rate
- Integrated optical or quartz crystal monitoring with automated layer control for exceptional thickness accuracy and repeatability
- Energy‑efficient design and intelligent heater placement minimize power consumption while maintaining reliable substrate temperature control
- Automation‑ready software with MES integration improves uptime, traceability, and production transparency for modern manufacturing environments
Highlights
Advanced Dual Electron Beam Technology
The dual electron beam configuration allows simultaneous use of multiple high and low index materials, supporting complex coating designs with minimal downtime. Intelligent shutter synchronization prevents cross contamination and optimizes layer transitions for faster, cleaner processes.
Single Pocket 3CK EB Gun:
- Optimized for low-index materials requiring stable, continuous evaporation
- Rotating crucible
- 350 cc pocket capacity
Multi Pocket 3CK EB Gun:
- Suitable for high-index materials and frequent material changes
- Allows rapid switching between oxides and non‑oxides
- Multiple configurations:
- 8 pockets up to 28 cc
- 4 pockets up to 60 cc
Advanced Process Control with Optical Monitoring
With wavelength ranges from 300 to 2400 nm and both transmittance and reflectance monitoring modes, the integrated optical monitoring system ensures precise layer termination. Automated test glass handling and seamless software integration deliver reliable results even for highly demanding coating specifications. Recipes can seamlessly switch between optical and crystal monitoring allowing users to combine speed and precision within a single process sequence
Plasma Assisted Coating for Superior Film Quality
The integrated ion assisting with cold plasma provides excellent coating densification while remaining gentle on temperature sensitive substrates. The extremely low and well-controlled substrate heating makes it ideally suited for polymeric and other sensitive substrates.
- 5kW RF plasma source
- Standard gas supply Argon and Oxygen, optionally can be operated with any gas
- Refractive indices of up to 2.46 at 520 nm for TiO2
Temperature increase due to plasma lower than 2°C during precleaning, lower than 50°C at maximum power
Energy Efficient Planetary Heating System
A uniquely positioned planetary heater behind the uniformity mask brings substrates to operating temperature rapidly and accurately while keeping energy consumption remarkably low. It avoids unnecessary heating of non‑relevant components, improving thermal homogeneity on the substrates and also minimizes temperature offsets, reduces ramp‑up times, and ensures reliable thermal conditions for demanding coating processes such as dense oxide layers, ion‑assisted coatings, or temperature‑sensitive multilayer stacks.
- Heats substrates up to 300 °C within 15 minutes with a peak consumption of only 6.4 kW. The average power is as low as 0.5 kW during a low temperature (60 °C) heating cycle.
Transmittance Spectra
(example)
Internal testing shows uniformity within +/- 1.0% of CWL.
Test using a Narrow bandpass filter on 2 runs & 2 planets with 3 samples for each planet.
Performed using either optical monitoring or quartz crystal for layer termination. Choice can be set for individual layers.
Tech Specs
| Materials: | plastic, glass and crystalline optics |
| Dimensions: | 2171 x 3145 x 2440 mm / 86 x 124 x 96 in |
| Planetary capacity: | 5 planets - 15 inch diameter each |
| Sector dome capacity: |
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All technical data subject to change without notice. Verify details with Satisloh.
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